Event
May 26–29, 2026

EIPBN 2026

EIPBN 2025

Visit us at the International Conference on Electron, Ion, Photon Beam Technology and Nanofabrication

This year, the 69th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication (EIPBN) will take place in Denver, Colorado. The conference brings together leading researches and engineers from all around the world to discuss recent trends in the field of electron, ion and photon lithography as well emerging nanofabrication approaches.

With the Nanoscribe Quantum X product line, we provide high-precision additive manufacturing systems for advanced 2.5 D and 3D microfabrication applications. Our systems enable the fabrication of complex structures with exceptional accuracy, including printing directly onto pre-patterned substrates and topographical surfaces.

The high-resolution 3D printer Quantum X shape offers versatile 3D microfabrication capabilities from the nanoscale to the macroscale. Combined with Nanoscribe’s breakthrough technology of Two-Photon Grayscale Lithography (2GL®), the system enables significantly increased printing throughput while maintaining outstanding precision. 

And don’t miss the invited talk by our CEO Martin Hermatschweiler on “Two-Photon Grayscale Lithography for Advanced Research and Industrial Manufacturing” as part of the session 1C: Additive Nanomanufacturing. The presentation will take place on May 27 from 1:30 to 2:00 PM.

Visit us at our booth 13 to explore the world of nano- and microfabrication! Meet our technical experts and discuss your innovation projects, application requirements and microfabrication challenges. We look forward to showing how the potential of high precision additive manufacturing for your application and how Nanoscribe’s 3D microfabrication technology can support your next breakthrough.

See you in Denver!

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