Printing materials for
2.5D surface patterning
From wafer-scale patterning to master template fabrication, grayscale lithography requires outstanding resolution, stable high-throughput performance, and excellent process control. Nanoscribe resins are specifically engineered for Two-Photon Grayscale Lithography (2GL®), offering low volume shrinkage, high two-photon sensitivity, and exceptionally smooth surfaces.
Their formulations ensure excellent shape accuracy, strong adhesion to silicon, glass, and further substrates, as well as mechanical stability. This enables reproducible results in both direct fabrication and master template manufacturing for replication. All Nanoscribe resins are qualified for nanoimprint lithography (NIL) and micro injection molding (µIM), including reliable demolding behavior to ensure excellent replica quality.
Explore our portfolio to find the resins that best support your workflow:
New IPX-Clear
Transparent resin for rapid prototyping & mastering of 2.5D micro-optics
IP-S
Resin for rapid prototyping and mastering of 2.5D micro-optics
IP-Dip2
High-resolution resin for 2.5D micro-optics, ideal for DOEs and nanophotonics
IPX-S
Resin for 2.5D micro-optics as functional prototypes or replication masters
OrmoComp®
Third-party high transparency photoresin available from micro resist technology
Interested in all our Photoresins
for Two-Photon Polymerization?
Find in-depth information and let us help you choose the material solution that fits your application.
