Join us at the 9th Nano-Micro-Lithography Symposium! The symposium 2025 will be held as an in-person event at the TU Eindhoven in the Netherlands. This gives us the opportunity to have a look at different lithography systems in a real lab context in one of Europe's top laboratories.
The symposium will feature an exciting mix of topics related to 3D laser, light, ion and electron beam lithography. Two high-level keynotes will highlight the prospects and technical potential of nano-micro lithography. Technical experts and customers from Heidelberg Instruments, Nanoscribe, micro resist technology and GenISys will present and describe the latest technologies and applications for nano-micro lithography. Several users of these products will provide detailed project insights and describe their experiences with various products, technologies and applications.
Nanoscribe will highlight the Quantum X align, equipped with Aligned 2-Photon Lithography A2PL® for nanoprecision alignment on optical fibers and photonic chips and using 3D printing by 2GL® for microoptics manufacturing and photonics packaging, improving both quality and speed.
The detailed program will be posted here soon, but you can register now to reserve your spot.
